Sputtering system with 3″ RF & DC magnetrons
Targets : ITO, SiO2, Si3N4, Si
gases : Ar, N2, O2
size of subtrate: up to 4″
E-beam evaporator for metallic thin films (Al, Au, Co, Cr, Ni, NiFe, Ti).
The load-lock is equipped with an argon ion gun for cleaning the samples.
The planetary sample holder is able to tilt from 0° to 270 ° and/or rotate during deposition.
E-beam Evaporator for non standard deposition (ex. CoFe).
The system is equipped with an ion gun (Ar, O2).
The sample can be heated up to 250°C with an halogen lamp
Thermal Evaporator for metallic thin films (Cr, Al, Au, Ag). The sample holder can be cool down with liquid nitrogen (77K) and tilted (0 – 90°)
Thermal Evaporator for exotic materials (metal, organic)
Institut de Physique et de Chimie des Matériaux de Strasbourg