STnano provides access to optical and e-beam lithography techniques, thin film deposition by evaporation, dry and wet etching on all types of substrates from 10 to 100 mm. The platform is equipped with latest generation equipment for nanofabrication and characterization (Oxford Instrument, Zeiss, Suss Microtec …).
- Metallic thin films evaporation (Au, Cu, Al, Ni, Co, …)
- Dielectric thin films evaporation (SiO2, Si3N4, Al2O3)
- Deep reactive etching (RIE-ICP)
- Oxygen plasma treatment
- Back end (AFM, wirebonding, 3D profilometry …)
STnano also trains technical staff and scientists from industry and academic research. The platform is open to partnerships. Our high skills engineer will help you to realize your project in the of nanotechnology from the design to the proof of concept